tfxrd 300/200
X-RAY DIFFRACTION ANALYSIS (XRD) SYSTEM for up to 300mm Wafer Full-mapping
NON-DESTRUCTIVE XRD MAPPING TOOL FOR NEAR-FAB APPLICATIONS
High-precision goniometer with selectable optics
XRD System for all thin film XRD applications and XY movable stage for mapping up to 300 mm wafers
Our non-destructive analysis technique is the most accurate and reliable method for measuring the physical and chemical properties of a wide range of materials, including crystalline powders, thin films, epitaxial films, and bulk solids. The TFXRD 300/200 is a dedicated XRD tool designed for the measurement of thin films on large-diameter wafers and measures the film thickness, the crystal quality, the composition ratio of the compound material, and relaxation of the epitaxial wafers, etc.
X-RAY DIFFRACTION ANALYSIS (XRD) SYSTEM guarantees that your samples will remain intact, ensuring you can conduct further experimentation and analysis without any issues. Trust us to provide the most precise and reliable results for all your research and development needs.
X-RAY DIFFRACTION ANALYSIS (XRD) SYSTEM
- Highest precision
- Efficient Measurement Speed
- Large Wafer full-Mapping
INCIDENT OPTICS
Incident Monochromator for high-resolution measurements. Use properly depending on the application
Features and benefits
- Highest precision goniometer with selectable optics for all thin film XRD applications and XY-movable stage for mapping
- Efficient Measurement Speed
- Incident Monochromator for high-resolution measurements
- Large Wafer full-Mapping
- For up to 300 mm wafers
SYSTEM PARAMETERS |
SPECIFICATIONS |
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Technique |
X-ray diffraction (XRD), rocking curve (XRC) and reflectivity (XRR) |
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Benefit |
High precision goniometer with full mapping XY-stage for large wafers (200mm, 300mm) |
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Technology |
High precision θ-2θ horizontal goniometer with large cradle |
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Core attributes |
Up to 300mm wafer full mapping XY stage |
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Core options |
PhotonMax high-flux 9 kW rotating anode X-ray source, Confocal Max-flux 800W rotating anode X-ray source, HyPix-3000 high energy resolution 2D HPAD detector |
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Computer |
External PC, MS Windows® OS, SmartLab Studio II software |
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Core dimensions |
Approx. 1900 (W) x 2200 (H) x 1900 (D) mm |
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Mass |
Approx. 1600kg |
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Power requirements |
3Ø, 200 V 50/60 Hz, 30 A (sealed tube) or 60 A (9kW rotating anode) |
APPLICATIONS
Semiconductor Metrology
XRD System Mapping Tool For Near-fab Applications
Improve materials analysis, enhanced quality control, and optimized manufacturing processes.
THIN FILMS
- Precise Thickens and Composition
- Crystallographic information
- Stress and Strain Analysis
- Non-destructive Characterization
- Multi-Layer Analysis
- Advanced Material Development
SPECIALIZED FOR XRR THICKNESS (XRR)
determine the thickness, density, and interface roughness of thin films, coatings, and multilayer structures.
GaAs(004)、GaNcub(002)、GaNhex(0004) SPECIALIZED EVALUATION
Precise analysis of the crystallographic orientations and control the growth and processing of materials to achieve desired performance in electronic and optoelectronic devices.
INFORMATION REQUEST
Rigaku Corporation
3-9-12, Matsubara-cho
Akishima-shi, Tokyo
196-8666, Japan
E-mail address info-gsm@rigaku.co.jp
Phone number +81 3-3479-0618
Rigaku Americas Corp.
9009 New Trails Drive
The Woodlands, TX
77381-5209, USA
E-mail address info@rigaku.com
Phone number +1-281-362-2300
Rigaku Europe SE
Hugenottenallee 167
Neu-Isenburg
63263 , Germany
E-mail address semieurope@rigaku.com
Phone Number +49 6102 77999 51
Who we are
Rigaku Semiconductor Metrology Division
Semiconductors have the power to change the world for the better. Here at Rigaku, we strive to make this a reality as the leading global supplier of X-ray metrology tools for semiconductor process R&D and high-volume manufacturing.
To contribute to the enhancement of humanity through scientific and technological development.
Value our customers, value our people, and value our technology.