All four layers, even the bottom Al, can be analyzed simultaneously thanks to the high-power (4 kW) X-ray source and the FP method.
Sequential WDXRF spectrometer for elemental analysis and thin-film metrology of large and/or heavy samples
Simultaneous WDXRF spectrometer for wafer metal film metrology; up to 200 mm wafers
In-line, simultaneous WDXRF spectrometer for wafer metal film metrology; up to 300 mm wafers
