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WD-XRF COMPOSITION MAPPING

OF A PZT SPUTTERING TARGET

 

EFFECTIVE MEASUREMENTS WITH WD-XRF:

  • Composition of multi-element sputtering targets
  • High precision and throughput,
  • Including trace elements analysis.
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AZX 400 Sequential WDXRF Spectrometer and Sample Adapters

 

The AZX 400 can analyze sputtering targets non-destructively over a wide range of elements (B to U). Using interchangeable sample adapters, the AZX 400 can also evaluate film thickness and composition of processed wafers. 

 

In this report, the Rigaku AZX 400 (sequential WDXRF spectrometer) maps composition across a PbZrTi(O) sputtering target.

Intense peak(s) will appear for the dominant elements (in this case, Pb, Zr, and Ti). For them, the user should consider the possibility of counting loss (by employing a filter to reduce Pb and Zr, in this case). This sample includes trace Si and Al.  

 

AZX 400 software has a standardless, semi-quantitative analysis program, called “SQX”. With this program, a qualitative scan is run, and the detected elements are then quantified by the

 

Fundamental Parameter (FP) method without the use of reference standard samples. SQX analysis has been performed including Si and Al.

 

 

 

WD-XRF Peak Intensity for Pb, Zr, Ti, Si, and Al Elements of Interest

azx 400 measurement conditions

*Filters, such as Cu or Sn, are normally used to reduce diffraction,  but they are also used to reduce background and excessive intensity.

Element Spectrum Pb Lα Ze Lα Ti Kα Al Kα Si Kα
kV-mA 50 kV - 60 mA 30 kV - 100 mA
Primary Filter *F-Cu *F-Cu *F-Sn OUT OUT
Diameter 20 mm
Counting Time (s) Peak 10 10 10 20 20
Background 5 5 5 10 10

 

10-time Repeatability Test (Center Point)

 

Component PbP Comp. ZrO2 Comp. TiO2 Comp. SiO2 Comp. Al2O3 Comp.
Unit mol% mol% mol% mol% mol%
Data No. 10 10 10 10 10
Average 54.798 2.407 21.659 0.087 0.050
Max. 54.849 23.438 21.722 0.089 0.053
Min. 54.758 23.373 21.575 0.082 0.048
Range 0.091 0.065 0.147 0.007 0.005
Std. Dev. 0.025 0.023 0.041 0.002 0.002
R.S.D. (%) 0.05 0.10 0.19 2.65 3.05

 

MAPPING POINTS AND 25-POINT MAPPING RESULTS

 

Component PbP Comp. ZrO2 Comp. TiO2 Comp. SiO2 Comp. Al2O3 Comp.
Unit mol% mol% mol% mol% mol%
Data No. 25 25 25 25 25
Average 54.782 23.427 21.654 0.085 0.053
Max. 54.888 23.480 21.860 0.112 0.099
Min. 54.620 23.353 21.501 0.065 0.040
Range 0.268 0.127 0.359 0.047 0.059
Std. Dev. 0.064 0.034 0.090 0.013 0.011
R.S.D. (%) 0.12 0.14 0.41 15.49 19.96

 

Mapping Points and 25-point Mapping Results

Maps Depicting the Spatial Distribution

of the Trace Elements

 

The AZX 400 sequential WDXRF spectrometer offers analytical flexibility to to measure large and/or heavy samples, like sputtering targets, as well as wafers and coupons of various size. Mapping capability can show the spatial distribution of elements, including trace elements. 

 

 

Maps Depicting the Spatial Distribution of the Trace Elements