Understanding Semiconductors | Episode 3
Understanding Semiconductors
Modern metrology from Lab to Fab by Rigaku.
A podcast for engineering leaders in characterization, metrology, process, and analytics, looking for discussion around semiconductor metrology challenges.
In this episode, IS THERE A DISTINCTION BETWEEN LAB AND FAB IN EARLY INCARNATION OF METROLOGY? HOW TO APPROACH THE FUTURE METROLOGY CHALLENGES?
Markus speaks with Professor Alain Diebold, Ph.D. | Viewpoints to a Modern and Efficient Approach to Metrology Challenges and Key Takeaways from 2022 Frontiers of Characterization and Metrology for Nanoelectronics Conference.
- Was there a distinction between lab and fab in early incarnations of Metrology?
- Success Stories out of Alain’s Relationship with SEMATECH
- How to Address the “Valley of Death” between a well-nurtured academic idea and an actual product?
- What is an effective way to approach future metrology challenges?
- The Purpose and “why” behind the 2022 Frontiers of Characterization and Metrology for Nanoelectronics Conference (FCMN)
Reach out to Markus Kuhn on LinkedIn for any potential guest requests or episode ideas.
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Ph.D. in Chemistry, University of Western Ontario, Canada BS Honors, University of Western Ontario, Canada. Markus is a semiconductor technology expert with a proven track record in developing, managing, and implementing novel metrology strategies and programs in support of advanced semiconductor process and architectural technology development. During a 25-year career with Intel and Digital Equipment Corporation, Markus was responsible for the development and implementation of a broad range of analytical capabilities to help meet semiconductor technology goals and was a key technical contributor to Intel's breakthrough strain, high K/metal gate, FinFET, and advanced memory programs. Currently, he is a Senior Director for Semiconductor Technology and a Fellow for Rigaku Corporation. His interests include the advancement of analytical capabilities for nanoscale devices, and he has a broader interest in the synergies between analytical characterization methods, machine learning, and process metrology to help enable emerging nanoscale device technologies. He has published 100+ refereed papers and holds 30+ patents relating to semiconductor technology.