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XHEMIS® EX-2000

XRR AND ED-XRF METROLOGY TOOL FOR BLANKET WAFERS

THICKNESS, DENSITY, ROUGHNESS, AND COMPOSITION OF FILMS ON BLANKET WAFERS

TECHNICAL SPECIFICATIONS

This versatile X-ray metrology tool uses X-ray fluorescence (EDXRF) and X-ray reflectivity (XRR) for high-throughput non-destructive measurement of thickness and density of blanket wafers ranging from ultrathin single-layer films to multilayer stacks for process development and film quality control.

 

DESIGNED FOR HIGH-VOLUME MANUFACTURING

XHEMIS EX-2000 is designed for high-volume manufacturing of up to 200 mm wafers. Outstanding stage alignment before measurement enables quick and accurate measurement of a variety of wafer samples. The highly accurate stage control enables full-surface mapping measurements in a short time.

 

USER-FRIENDLY DESIGNED TOOL

When equipped with a transfer robot, XHEMIS EX-2000 can handle wafers automatically. AutoCal (an automatic calibration function) maintains constant tool conditions. User-friendly software makes tool operation and data analysis easy. This tool can be used for a variety of applications from research to production for quality control.

 

 

 

 

 

 

 

 

 

FEATURES & BENEFITS

 

  • Wide range of materials and applications
  • Simultaneous evaluation of film thickness, density and roughness
  • High-throughput wafer measurements
  • Absolute results from XRR (no calibration standards required)
  • Full-wafer mapping and high-speed measurements by XRF
  • High resolution and precision covering thicknesses from Ångstroms to microns
  • Accepts 200 mm, 150 mm, 125 mm and 100 mm wafers
  • Available auto-calibration function

 

SYSTEM PARAMETERS

SPECIFICATIONS

Technique X-ray reflectometry and X-ray fluorescence with XYθ sample stage
Benefit Measure ultra-thin single-layer films to multi-layer stacks.
Obtain film thickness, density, and roughness by XRR (without standards), obtain thickness / composition by XRF (with standards)
Technology XRR and small-spot XRF
Core attributes Cu sealed-tube source for XRR; Cr sealed-tube source for XRF, SEMI S2/S8 design
Core options Auto loader, XRF system, X-ray tube type, SECS/GEM
Computer Internal PC, MS Windows® OS
Core dimensions 1250 (W) x 1825 (H) x 2400 (D) mm (with auto loader)
Mass 1600 kg (core unit with auto loader)
Power requirements 3Ø, 200 VAC 50/60 Hz, 60A
 
 

TRUSTED PARTNER

WHO WE ARE
Pharmaceuticals have the power to change the world for the better, but before they can ever do that, they need to be proven safe and trustworthy. Here at Rigaku, we strive to make this a reality as the leading global scientific analytical instrumentation company specializing in X-ray and thermal analysis, and Raman spectroscopy.

CORPORATE MISSION
To contribute to the enhancement of humanity through scientific and technological development.

CORPORATE MOTTO
Value our customers, value our people, and value our technology
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