TXRF 3760
WAFER SURFACE CONTAMINATION
FOR UP 200 mm WAFERS
COMPACT spectrometer
MEASURE ELEMENTAL CONTAMINATION
AT DISCRETE POINTS OR WITH FULL WAFER MAPS
TECHNICAL SPECIFICATIONS
TXRF analysis can gauge contamination in all fab processes, including cleaning, litho, etch, ashing, films, etc. The TXRF 3760 can measure elements from Na through U with a single-target, 3-beam X-ray system, and a liquid nitrogen-free detector system.
The TXRF 3760 includes Rigaku's patented XYθ sample stage system, an in-vacuum wafer robotic transfer system, and new user-friendly Windows software. These contribute to higher throughput, accuracy and precision, and easy routine operation.
Optional Sweeping TXRF software enables mapping the contaminant distribution over the wafer surface to identify "hot spots" that can be automatically re-measured at higher precision.
Optional ZEE-TXRF capability overcomes the historical 15 mm edge exclusion of original TXRF designs, enabling measurements to be made with zero edge exclusion.
HIGH-RELIABILITY WAFER SURFACE CONTAMINATION ANALYSIS
Total Reflection X-ray Fluorescence (TXRF) is an indispensable tool for materials and device development for semiconductor manufacturing. Remarkable reliability is achieved thanks to newly developed X-ray optics, a new stage mechanism, and a new concept in compact rotating-anode X-ray sources. Also, a new, low-COO TXRF model offers reduced initial and operating costs.
FEATURES & BENEFITS
- Ease of operation and rapid analysis results
- Accepts 200 mm and smaller wafers
- Compact design, footprint
- High-power rotating-anode source
- Wide range of analytical elements (Na~U)
- Light-element sensitivity (for Na, Mg, and Al)
- Application to bare Si and to non-Si substrates
- Import measurement coordinates from defect inspection tools for follow-up analysis
SYSTEM PARAMETERS |
SPECIFICATIONS |
Technique | Total reflection X-ray fluorescence (TXRF) |
Benefit | Rapid elemental analysis, of Na to U, to gauge wafer contamination in all fab processes |
Technology | 3-beam TXRF system with liquid nitrogen-free detector |
Core attributes | Up to 200 mm wafers, XYθ sample stage system, in-vacuum wafer robotic transfer system, ECS/GEM communication software |
Core options | Sweeping TXRF software enables mapping of the contaminant distribution over the wafer surface to identify "hot spots." ZEE-TXRF capability enabling measurements to be made with zero edge exclusion |
Computer | Internal PC, MS Windows® OS |
Core dimensions | 1000 (W) x 1760 (H) x 948 (D) mm |
Mass | 100 kg (core unit) |
Power requirements | 3Ø, 200 VAC 50/60 Hz, 100 A |
APPLICATIONS
LOWER LIMITS OF DETECTION (LLD) OF TXRF *1
Measurement time: 1000 sec Unit: atoms/cm2 1 Typical Value 2 In case of film-type contamination
Atoms/cm2 | Na | Al | Fe | Ni | Cu |
TXRF 3760 | 2.5x1011*12 | 2.5x1011*2 | 1.0x109 | 1.0x109 | 1.5x109 |
APPLICABLE TO A VARIETY OF WAFERS AND APPLICATIONS
Si, SiC, GaN, Ga2O3, Diamond (...)
The application of Total-reflection X-ray Fluorescence analysis is not limited to the analysis of metallic contamination on bare silicon wafers.
TXRF analysis can be applied to gauge the cleanness of all fab processes, including cleaning, lithography, etching, ashing, films, etc.
Beyond silicon devices, this technique is also applicable to the fields of SiC power devices, compound semiconductors, MEMS, organic lectroluminescent materials, etc.
Rigaku Corporation
3-9-12, Matsubara-cho
Akishima-shi, Tokyo
196-8666, Japan
E-mail address info-gsm@rigaku.co.jp
Phone number +81 3-3479-0618
Rigaku Americas Corp.
9009 New Trails Drive
The Woodlands, TX
77381-5209, USA
E-mail address info@rigaku.com
Phone number +1-281-362-2300
Rigaku Europe SE
Hugenottenallee 167
Neu-Isenburg
63263 , Germany
E-mail address semieurope@rigaku.com
Phone Number +49 6102 77999 51
TRUSTED PARTNER
Pharmaceuticals have the power to change the world for the better, but before they can ever do that, they need to be proven safe and trustworthy. Here at Rigaku, we strive to make this a reality as the leading global scientific analytical instrumentation company specializing in X-ray and thermal analysis, and Raman spectroscopy.
CORPORATE MISSION
To contribute to the enhancement of humanity through scientific and technological development.
CORPORATE MOTTO
Value our customers, value our people, and value our technology