MEASURE ELEMENTAL CONTAMINATION
AT DISCRETE POINTS OR WITH FULL WAFER MAPS
TXRF analysis can gauge contamination in all fab processes, including cleaning, litho, etch, ashing, films, etc. The TXRF 3760 can measure elements from Na through U with a single-target, 3-beam X-ray system and a liquid nitrogen-free detector system.
The TXRF 3760 includes Rigaku's patented XYθ sample stage system, an in-vacuum wafer robotic transfer system, and new user-friendly windows software. All of these contribute to higher throughput, higher accuracy and precision, and easy routine operation.
Optional Sweeping TXRF software enables mapping of the contaminant distribution over the wafer surface to identify "hot spots" that can be automatically re-measured at higher precision. Optional ZEE-TXRF capability overcomes the historical 15 mm edge exclusion of original TXRF designs, enabling measurements to be made with zero edge exclusion.
TRUSTED PARTNER
Pharmaceuticals have the power to change the world for the better, but before they can ever do that, they need to be proven safe and trustworthy. Here at Rigaku, we strive to make this a reality as the leading global scientific analytical instrumentation company specializing in X-ray and thermal analysis, and Raman spectroscopy.
CORPORATE MISSION
To contribute to the enhancement of humanity through scientific and technological development.
CORPORATE MOTTO
Value our customers, value our people, and value our technology
HOW WE WORK WITH YOU
1 - FREE CONSULTATION
A CALL TO UNDERSTAND YOUR CHALLENGES
NEED TO REDUCE COSTS?
NEED A SPECIFIC APPLICATION?
HOW CAN WE HELP YOU?
2 - GET A DEMO
SCHEDULE A DEMO ON YOUR TERMS
ON-DEMAND RECORDINGS
LIVE VIRTUAL & CUSTOM
IN-PERSON GROUPS & INDIVIDUAL
3 - GET A QUOTE
BUILD SOLUTIONS PACKAGE RIGHT FOR YOUR NEEDS
TECHNOLOGY
INSTALL & TRAINING
SUPPORT & SERVICE
