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X-RAY METROLOGY TOOLS FOR SEMICONDUCTOR FAB

Metrology Solutions for

process R&D and high-volume manufacturing

WD-XRF TOOLS

WD-XRF: Wavelength Dispersive X-ray Fluorescence Spectrometer  | Typically for crystallographic phase, crystallite size (or grain size), and material orientation (or texture) of polycrystalline films.

AZX 400

Sequential WD-XRF spectrometer

AZX 400 Transparent Bcakground

 

Analytical flexibility for process R&D and low-volume manufacturing and high-product-mix

 

WDA-3650

SIMULTANEOUS WD-XRF spectrometer

Image - WDA-3650 - with autoloader 800x610

 

Film thickness and composition measurements on blanket wafers

 

Waferx 310

SIMULTANEOUS WD-XRF spectrometer

Image - WaferX 310 - 2018-11-21 800x610

 

In-line, simultaneous WD-XRF spectrometer for high-volume manufacturing

EXPLORE AZX 400
EXPLORE WDA-3650
EXPLORE WAFERX 310

XRR, ED-XRF & OPTICAL TOOLS

XRR: X-ray Reflective Spectrometer | Typically for characterization of a multilayered sample

ED-XRF: Energy-dispersive X-ray fluorescence (ED-XRF) spectrometer

OPTICAL TOOLS: Hybrid wafer metrology combining micro-spot ED-XRF and 2D microscope, and 3D scanner for In-line non-destructive inspection and metrology.

ONYX 3000

Micro-spot ED-XRF and Optical Inspection (2D-3D)

Onyx 3000 view 1

 

 

In-line non-destructive inspection and metrology for the semiconductor and micro-electronics industries ≤300 mm wafers

 

xhemis® ex-2000

ED-XRF and XRR for High-Volume Manufacturing

Image - XHEMIS EX-2000

 

Thickness, density, roughness, and composition of films on blanket wafers metrology tool for blanket wafers ≤200 mm

 

xTRAIA® MF-2000

Process XRR, ED-XRF, and XRD Metrology Fab Tool

XTRAIA MF-2000 Transparent

 

 

Blanket and patterned metal layer thickness and composition

 

xTRAIA® MF-3000

XRR, ED-XRF, XRD Metrology Optimized for High-Volume Manufacturing

XTRAIA MF3000

 

 

Blanket and patterned metal layer thickness and composition

 

EXPLORE ONYX 3000
EXPLORE
EXPLORE
EXPLORE XTRAIA MF-3000

TXRF TOOLS

TXRF: Total Reflection X-ray Fluorescence | Typically for surface contamination

TXRF 3800e

COMPACT TXRF SPECTROMETER

TXRF 3800e

 

 

Wafer Surface Contamination Metrology With Light Elements Sensitivity

 

TXRF 3760

COMPACT TXRF SPECTROMETER

Image - TXRF 3760 - 2018-11-27

 

Wafer Surface Contamination Metrology

 

 

TXRF310Fab

TXRF SPECTROMETER FOR HVM

Image - TXRF 310Fab - 2018-12-18

 

For The Highest Throughput Wafer Surface Contamination Metrology

 

TXRF-V310

INTEGRATED VPD-TXRF SPECTROMETER

TXRF-V310

 

For The Highest Sensitivity Wafer Surface Contamination Metrology

 

Explore TXRF 3800e
Explore TXRF 3760
EXPLORE TXRF310Fab
EXPLORE

SEMICONDCUTOR METROLOGY

DOWNLOAD OUR SEMICONDUCTOR METROLOGY TOOLS CATALOG

Film thickness/composition and wafer contamination tools

 

Rigaku is a pioneer and world leader in designing and manufacturing X-ray technology-based instrumentation to solve manufacturing challenges in semiconductor R&D and production. With more than 35 years of global market leadership in this industry, our families of products enable everything from in-fab process control metrology to R&D for thin film and materials characterization. Rigaku X-ray Diffraction (XRD), X-ray Fluorescence (XRF), X-ray Reflectometry (XRR), and X-ray topography (XRT) metrology tools measure critical parameters like thin film: thickness, composition, roughness, density, porosity, and crystal structure and crystal structure defects. In addition, we offer Total process Reflection X-ray Fluorescence (TXRF) and Vapor Phase Decomposition-Total Reflection X-ray Fluorescence (VPD-TXRF) tools for at-line or in-line surface contamination measurements. With global 24/7 service and support, Rigaku delivers cutting-edge solutions for yield enhancement and process development.