CONSULT AN EXPERT - TXRF 3760

WAFER SURFACE CONTAMINATION METROLOGY BY TXRF FOR ≤200 mm WAFERS

TXRF analysis can gauge contamination in all fab processes, including cleaning, litho, etch, ashing, films, etc. The TXRF 3760 can measure elements from Na through U with a single-target, 3-beam X-ray system and a liquid nitrogen-free detector system.