WD-XRF APPLICATION
THICKNESS AND COMPOSITION OF
PIEZOELECTRIC PZT FILMS
WD-XRF can monitor piezoelectric PZT film thickness and composition with high precision and throughput.
Thin PZT Repeatability Test
Metrology Tool: WDA-3650
Indicators: 15 mm collimator, 60 sec count time
Thick PZT Repeatability Test
Metrology Tool: WDA-3650
Indicators: 10 mm collimator, 40 sec count time
| PZT_THK | PbO | ZrO2 | TiO2 | |
| nm | mol% | mol% | mol% | |
| 1 | 62.6 | 34.98 | 30.09 | 34.93 |
| 2 | 62.8 | 34.75 | 30.31 | 34.94 |
| 3 | 62.7 | 34.87 | 30.05 | 35.08 |
| 4 | 62.8 | 34.82 | 30.24 | 34.94 |
| 5 | 62.6 | 34.85 | 30.21 | 34.94 |
| 6 | 62.7 | 34.86 | 30.10 | 35.04 |
| 7 | 62.7 | 34.73 | 30.24 | 35.04 |
| 8 | 62.7 | 34.85 | 30.13 | 35.02 |
| 9 | 62.7 | 34.90 | 30.01 | 35.09 |
| 10 | 62.6 | 34.94 | 29.95 | 35.11 |
| Average | 62.7 | 34.85 | 30.18 | 34.97 |
| Maximum | 62.8 | 34.98 | 30.31 | 35.08 |
| Minimum | 62.6 | 34.75 | 30.05 | 34.93 |
| Range | 0.2 | 0.23 | 0.26 | 0.15 |
| s.d. | 0.08 | 0.084 | 0.108 | 0.064 |
| r.s.d. (%) | 0.13 | 0.24 | 0.36 | 0.18 |
| PZT_THK | PbO | ZrO2 | TiO2 | |
| nm | mol% | mol% | mol% | |
| 1 | 3931.3 | 54.48 | 24.27 | 21.25 |
| 2 | 3927.1 | 54.48 | 24.33 | 21.19 |
| 3 | 3921.9 | 54.52 | 24.26 | 21.22 |
| 4 | 3928.3 | 54.45 | 24.33 | 21.21 |
| 5 | 3924.5 | 54.48 | 24.34 | 21.18 |
| 6 | 3928.0 | 54.49 | 24.30 | 21.22 |
| 7 | 3828.9 | 54.44 | 24.31 | 21.25 |
| 8 | 3928.5 | 54.47 | 24.32 | 21.21 |
| 9 | 3929.3 | 54.47 | 24.28 | 21.25 |
| 10 | 3930.1 | 54.46 | 24.29 | 21.25 |
| Average | 3927.8 | 54.47 | 24.30 | 21.22 |
| Maximum | 3931.3 | 54.52 | 24.34 | 21.25 |
| Minimum | 3921.9 | 54.44 | 24.26 | 21.18 |
| Range | 9.4 | 0.08 | 0.08 | 0.07 |
| s.d. | 3.60 | 0.025 | 0.038 | 0.027 |
| r.s.d. (%) | 0.09 | 0.05 | 0.16 | 0.13 |
RECOMMENDED RIGAKU SEMICONDUCTOR METROLOGY TOOLS
AZX 400
Sequential WDXRF spectrometer for elemental analysis and thin-film metrology of large and/or heavy samples
WDA-3650
Simultaneous WDXRF spectrometer for wafer metal film metrology; up to 200 mm wafers
WAFERX 310
In-line, simultaneous WDXRF spectrometer for wafer metal film metrology; up to 300 mm wafers
